Optimizing the seeded CVD-growth of uniform graphene films on silicon

The seeded growth of graphene

In this paper, we demonstrate the seeded growth of graphene under a plasma chemical vapor deposition condition. First, we fabricate graphene nanopowders (~5 nm) by ball-milling commercial multi-wall carbon nanotubes. The graphene nanoparticles were subsequently subject to a direct current plasma generated in a 100 Torr 10%CH4 - 90%H2 gas mixture. The plasma growth enlarged, over one hour, the n...

Atomically Uniform Thin Films on Silicon

Uniform and selective CVD growth of carbon nanotubes and nanofibres on arbitrarily microstructured silicon surfaces

Carbon nanotubes (CNTs) and nanofibres (CNFs) are grown on bulk-micromachined silicon surfaces by thermal and plasma-enhanced chemical vapour deposition (PECVD), with catalyst deposition by electron beam evaporation or from a colloidal solution of cobalt nanoparticles. Growth on the peaked topography of plasma-etched silicon ‘micrograss’ supports, as well as on sidewalls of vertical structures ...

Low temperature CVD growth of PbS films on plastic substrates.

The low temperature growth of crystalline PbS films has been achieved on plastic substrates by CVD using a xanthate. The possible mechanism involved in this low temperature deposition has been probed by density functional theory calculations.

Catalytic degradation of phenols by recyclable CVD graphene films.

Ferrous ion-based catalysts have been widely employed to oxidatively destruct the major industrial pollutants such as phenolic compounds through advanced oxidation processes (AOPs). These agents, however, inevitably show several drawbacks including the need for pH adjustment and further purification steps to remove residual salts. Here we report the use of a chemical vapour deposition (CVD) gra...